Materials Science and Technology 2015 (MS&T15)
Posted:
The Materials Science and Technology 2015 (MS&T15) symposium on Electron and Focused Ion Beam Microscopy Tools in Materials Characterization will be held October 4-8, 2015, in Columbus, Ohio. Areas include:
• Ion and electron beam irradiation effects on materials properties,
• In-situ methods to probe the local heating, electrical, electrochemistry, environmental, field emission, and mechanical properties of materials,
• Synthesis and patterning of structures by deposition or sputtering methods,
• Ultrafast electron microscope to elucidate materials response with picosecond/femtosecond temporal resolution,
• Electron holography techniques to explore electrostatic and magnetic fields,
• Applications of new ion beam sources in FIB microscopy,
• Simulation of electron- and ion- image formation,
• Transmission-EM and FIB/Scanning (S)-EM 3D tomography combined with computational analysis and spectroscopy methods,
• Multi-beam instrumentation for the purposes of micro-fabrication or serial sectioning microscopy.
• Applications of spectroscopy techniques in compositional and chemical state mapping, bonding, defect analysis, and optical and plasmonic response of materials,
• Imaging and electron diffraction techniques.
• In-situ methods to probe the local heating, electrical, electrochemistry, environmental, field emission, and mechanical properties of materials,
• Synthesis and patterning of structures by deposition or sputtering methods,
• Ultrafast electron microscope to elucidate materials response with picosecond/femtosecond temporal resolution,
• Electron holography techniques to explore electrostatic and magnetic fields,
• Applications of new ion beam sources in FIB microscopy,
• Simulation of electron- and ion- image formation,
• Transmission-EM and FIB/Scanning (S)-EM 3D tomography combined with computational analysis and spectroscopy methods,
• Multi-beam instrumentation for the purposes of micro-fabrication or serial sectioning microscopy.
• Applications of spectroscopy techniques in compositional and chemical state mapping, bonding, defect analysis, and optical and plasmonic response of materials,
• Imaging and electron diffraction techniques.
On behalf of the symposium organizers, David W. McComb, Michael D. Uchic, Yong Zhu, I would like to warmly invite you to submit an abstract and to participate in this exciting event. Reach more than 3,200 scientists, engineers, and students from around the world.
The deadline for abstract submission is March 15, 2015.
Category: Focused Ion Beam
